Fujimi Corporation’s Jimmy Granstrom and Hisashi Takeda presented a paper at the Twentieth International Symposium on Chemical-Mechanical Planarization, hosted by CAMP in Lake Placid, New York August 7-10 2016. The research paper, titled “>Copper Corrosion Suppression For Advanced Nodes In Ruthenium Barrier Chemical Mechanical Polishing“, was presented on August 8
Exhibition
Join Us at the SEMA Show 2024!
Fujimi is proud to bring our cutting-edge polish and compound technology to the Las Vegas Convention Center from Nov 4th to 8th. Visit us at