Fujimi Corporation’s Jimmy Granstrom and Hisashi Takeda presented a paper at the Twentieth International Symposium on Chemical-Mechanical Planarization, hosted by CAMP in Lake Placid, New York August 7-10 2016. The research paper, titled “>Copper Corrosion Suppression For Advanced Nodes In Ruthenium Barrier Chemical Mechanical Polishing“, was presented on August 8
Exhibition
Visit Us at Automechanika Frankfurt 2024
Visit the Fujimi booth on Sep 10th thru 14th at the Automechanika Frankfurt 2024 in Frankfurt, Germany to learn about our polishes and compounds for