In August 2012, Fujimi Research & Development personnel presented the company’s current ruthenium barrier slurry development work at the 17th Annual Symposium on Chemical-Mechanical Planarization (CMP) in Lake Placid, NY.
Presentation attendess included CMP end users; university staff; and tool, pad and slurry manufacturers. The symposium is organized by the Center for Advanced Materials Processing (CAMP) at Clarkson University.
Presentation file: Fujimi Ru CAMP 2012 FINAL6 Conference Presentation