Exhibition
Join Us at the SEMA Show 2024!
Fujimi is proud to bring our cutting-edge polish and compound technology to the Las Vegas Convention Center from Nov 4th to 8th. Visit us at
October 15, 2024
The Fujimi group presented a study titled, “EHS Friendly Slurries with High Poly Si Removal Rate and Nearly Zero ILD Loss” at the 20th International Symposium on Chemical-Mechanical Planarization in August, 2016. The study was co-authored by Haiyan Li, Akira Endou, Annette Schaper, Todd Eck, Toshio Shinoda, and Anne Miller who represent a mix of researchers from Fujimi Corporation and Fujimi Incorporated.
Fujimi is proud to bring our cutting-edge polish and compound technology to the Las Vegas Convention Center from Nov 4th to 8th. Visit us at
In a recent comprehensive analysis, Fujimi Corporation confirmed that all water samples associated with its operations—municipal, purified, and wastewater—contained no per- and polyfluoroalkyl substances (PFAS)
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