PLANERLITE 4000 SERIES – CMP Slurry

Fujimi’s PLANERLITE 4000 series of CMP polishing slurries are designed for use on SiO2 films (interlayer dielectric/ILD, shallow trench isolation/STI).

Category CMP (Chemical Mechanical Planarization)

ApplicationChemical Mechanical Planarization (Cmp), Ild Polish, Interlayer Dielectric (Ild), Shallow Trench Isolation (Sti), Sio2 Films, Sti Polish

TypeSlurry

Material Colloidal Silica, Fumed Silica

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Fujimi’s global network is designed to meet the demands of our customers and provide the highest quality of materials and support available. Our network consists of Fujimi Incorporated, located in Japan, and its four subsidiaries strategically located around the globe.

PLANERLITE 4000 SERIES – CMP Slurry

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