Doctor Shinya Hirano to Head the Fujimi SiC Center for Excellence
Fujimi is a recognized leader in CMP polishing slurries and lapping solutions to the semiconductor market. Today, Fujimi would like to announce the arrival of
Fujimi is a recognized leader in CMP polishing slurries and lapping solutions to the semiconductor market. Today, Fujimi would like to announce the arrival of
Fujimi is a recognized leader in CMP polishing slurries and lapping solutions to the semiconductor market. Today, Fujimi would like to announce that we have
Kiyosu, Aichi, March 29, 2018 – Fujimi Incorporated (TSE: 5384), a pioneer in the field ofmanufacturing synthetic precision abrasives as well as a leading supplier of
Tualatin, OR, March 7, 2018 – Fujimi Corporation has been recognized by Intel as a recipient ofa 2017 Preferred Quality Supplier (PQS) award. The PQS award
FUJIMI –Introducing POLIPLA to the Americas Press Release Date: July 17, 2017 Fujimi is an independent slurry manufacturer with over 30 years of experience producing
Hooi-Sung (Brian) Kim, PhD at Fujimi Corporation presented a study titled, “The Impact of Sample Containers on Large Particle Count for CMP Slurries”, at the
Fujimi Corporation’s Senior Product Development Chemist, Dr. Jie Lin, presented a paper at China Semiconductor Technology International Conference, CSTIC 2017 (March 12-13 in Shanghai, China).
Fujimi Corporation has been recognized by Intel as a 2016 Supplier Continuous Quality Improvement (SCQI) award winner. The SCQI award is Intel’s most distinguished supplier
The Fujimi group presented a study titled, “EHS Friendly Slurries with High Poly Si Removal Rate and Nearly Zero ILD Loss” at the 20th International Symposium
Fujimi Corporation’s Jimmy Granstrom and Hisashi Takeda presented a paper at the Twentieth International Symposium on Chemical-Mechanical Planarization, hosted by CAMP in Lake Placid, New
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